| Category | Muffle Furnace |
| Model | Oxidation Furnace |
| Max Temperature | 1000°C (1832°F) |
| Working Temperature | 900°C |
| Thermocouple Type | N (Nicrosil-Nisil) |
| Thermocouple Details | Tolerance Class 2, 0 to +1100°C range, MgO insulated mineral, Inconel 600 sheath, 6mm diameter, Type N |
| Heating Element | Kanthal A1 (FeCrAl) |
| Element Details | Max temp: 1425°C, Superior cyclic performance, FeCrAl alloy with rare earth elements |
| Chamber (MM) | 270 x 270 x 510 |
| Outer Body (MM) | 675.0 x 885.0 x 795.0 |
| Chamber Volume | 37.2 Litres |
| Volume (cu.ft) | 17 ft³ |
| Power Load | 12.58 kW |
| Power Supply | 440V, Three Phase |
| Gross Weight | 139.19 kg |
| Chamber Shape | Square |
This furnace is used to intentionally oxidize materials, either as a processing step (e.g., growing oxide films on silicon wafers) or to test a material's oxidation resistance. Operating at temperatures like 800°C, it exposes samples to an oxygen-rich environment. The working principle involves flowing oxygen or air through a heated chamber containing the sample. Its purpose in semiconductor manufacturing is to create silicon dioxide insulating layers. In materials testing, it is used to measure weight gain over time to evaluate alloys for high-temperature service, such as in turbine engines.
Trutherm manufactures 1000 Degree Celsius (°C) Oxidation Furnace 270 x 270 x 510 MM Chamber for buyers who search by exact machine type, chamber size and 1000°C temperature rating. This page is specific to the MM dimension version, so the chamber size is presented in the unit normally used in the buyer's drawing, tender or purchase request.
This configuration is suitable when the sample load must fit a 270 x 270 x 510 MM chamber with usable chamber volume of 37.2 litre, approximate power load of 12.4 kW, square chamber profile. It is commonly selected for laboratory, QC, metallurgical, ceramic, pharmaceutical and industrial heat-treatment work requiring stable heating and repeatable process conditions. Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
Equivalent chamber references: 270 x 270 x 510 MM, 27 x 27 x 51 CM and 10 x 10 x 20 INCH. Buyers searching for 1000 Degree Celsius Oxidation Furnace 270 x 270 x 510 MM chamber; 1000°C Oxidation Furnace 270 x 270 x 510 MM; 1000 Degree Celsius Oxidation Furnace 27 x 27 x 51 CM chamber; 1000°C Oxidation Furnace 27 x 27 x 51 CM; 1000 Degree Celsius Oxidation Furnace 10 x 10 x 20 INCH chamber; 1000°C Oxidation Furnace 10 x 10 x 20 INCH can verify the same physical chamber on this canonical product page before requesting price, GST invoice, packaging and delivery.
Uniform chamber heating and a simple door-loading design make a muffle furnace straightforward to standardise across multiple operators and shifts.
Where sample volume and process type vary week to week, a general-purpose muffle furnace avoids the cost of maintaining several process-specific furnace types.
As a general-purpose muffle furnace, this model covers a broader range of routine heating tasks than a process-specific ashing, tube or sintering furnace, making it the practical default when the lab runs mixed sample types rather than one dedicated process.