| Category | Muffle Furnace |
| Model | Oxidation Furnace |
| Max Temperature | 1000°C (1832°F) |
| Working Temperature | 900°C |
| Thermocouple Type | N (Nicrosil-Nisil) |
| Thermocouple Details | Tolerance Class 2, 0 to +1100°C range, MgO insulated mineral, Inconel 600 sheath, 6mm diameter, Type N |
| Heating Element | Kanthal A1 (FeCrAl) |
| Element Details | Max temp: 1425°C, Superior cyclic performance, FeCrAl alloy with rare earth elements |
| Chamber (MM) | 330 x 330 x 650 |
| Outer Body (MM) | 745.0 x 940.0 x 925.0 |
| Chamber Volume | 70.8 Litres |
| Volume (cu.ft) | 23 ft³ |
| Power Load | 16.06 kW |
| Power Supply | 440V, Three Phase |
| Gross Weight | 193.14 kg |
| Chamber Shape | Square |
This furnace is used to intentionally oxidize materials, either as a processing step (e.g., growing oxide films on silicon wafers) or to test a material's oxidation resistance. Operating at temperatures like 800°C, it exposes samples to an oxygen-rich environment. The working principle involves flowing oxygen or air through a heated chamber containing the sample. Its purpose in semiconductor manufacturing is to create silicon dioxide insulating layers. In materials testing, it is used to measure weight gain over time to evaluate alloys for high-temperature service, such as in turbine engines.
This configuration is suitable when the sample load must fit a 330 x 330 x 650 MM chamber with usable chamber volume of 70.8 litre, approximate power load of 16.2 kW, square chamber profile. It is commonly selected for laboratory, QC, metallurgical, ceramic, pharmaceutical and industrial heat-treatment work requiring stable heating and repeatable process conditions. Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
Equivalent chamber references: 330 x 330 x 650 MM, 33 x 33 x 65 CM and 13 x 13 x 26 INCH. Buyers searching for 1000 Degree Celsius Oxidation Furnace 330 x 330 x 650 MM chamber; 1000°C Oxidation Furnace 330 x 330 x 650 MM; 1000 Degree Celsius Oxidation Furnace 33 x 33 x 65 CM chamber; 1000°C Oxidation Furnace 33 x 33 x 65 CM; 1000 Degree Celsius Oxidation Furnace 13 x 13 x 26 INCH chamber; 1000°C Oxidation Furnace 13 x 13 x 26 INCH can verify the same physical chamber on this canonical product page before requesting price, GST invoice, packaging and delivery.
Trutherm manufactures 1000 Degree Celsius (1000°C) Oxidation Furnace 330 x 330 x 650 MM Chamber for buyers who search by exact machine type, chamber size and 1000°C temperature rating. This page is specific to the MM dimension version, so the chamber size is presented in the unit normally used in the buyer's drawing, tender or purchase request.
Routine QC and teaching labs value a muffle furnace precisely because one unit can cover several standard test methods without dedicated process-specific tooling.
Uniform chamber heating and a simple door-loading design make a muffle furnace straightforward to standardise across multiple operators and shifts.
As a general-purpose muffle furnace, this model covers a broader range of routine heating tasks than a process-specific ashing, tube or sintering furnace, making it the practical default when the lab runs mixed sample types rather than one dedicated process.