About This 1100°C Lab Furnace 800 x 800 x 885 MM Chamber
Trutherm Lab Furnace models cover common laboratory furnace requirements with digital temperature control, insulated chamber construction and optional customized sizes for samples, crucibles and trays.
Trutherm manufactures 1100 Degree Celsius (°C) Lab Furnace 800 x 800 x 885 MM Chamber for buyers who search by exact machine type, chamber size and 1100°C temperature rating. This page is specific to the MM dimension version, so the chamber size is presented in the unit normally used in the buyer's drawing, tender or purchase request.
This configuration is suitable when the sample load must fit a 800 x 800 x 885 MM chamber with usable chamber volume of 566.4 litre, approximate power load of 37.6 kW, square chamber profile. It is commonly selected for laboratory, QC, metallurgical, ceramic, pharmaceutical and industrial heat-treatment work requiring stable heating and repeatable process conditions. Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
Equivalent chamber references: 800 x 800 x 885 MM, 80 x 80 x 89 CM and 32 x 32 x 35 INCH. Buyers searching for 1100 Degree Celsius Lab Furnace 800 x 800 x 885 MM chamber; 1100°C Lab Furnace 800 x 800 x 885 MM; 1100 Degree Celsius Lab Furnace 80 x 80 x 89 CM chamber; 1100°C Lab Furnace 80 x 80 x 89 CM; 1100 Degree Celsius Lab Furnace 32 x 32 x 35 INCH chamber; 1100°C Lab Furnace 32 x 32 x 35 INCH can verify the same physical chamber on this canonical product page before requesting price, GST invoice, packaging and delivery.
A muffle furnace isolates the sample from direct contact with heating elements or combustion gases, giving cleaner, more repeatable results than an open flame or hot-plate process.
Because muffle furnaces are used across ashing, drying, calcination and light heat-treatment, the chamber and controller are specified for flexibility rather than one narrow process window.
FAQs for 1100 Degree Celsius (°C) Lab Furnace 800 x 800 x 885 MM Chamber
Can Trutherm supply 1100 Degree Celsius (°C) Lab Furnace 800 x 800 x 885 MM Chamber with custom controls?
Yes. Controller type, safety devices, body material, power connection and documentation can be configured according to application and site requirements.
Is this chamber size available in CM and INCH also?
Yes. The same chamber is listed as 800 x 800 x 885 MM, 80 x 80 x 89 CM and 32 x 32 x 35 INCH so searches and purchase documents using any common dimension unit match this product.
How is pricing decided for 1100 Degree Celsius (°C) Lab Furnace 800 x 800 x 885 MM Chamber?
Price depends on chamber size, temperature rating, insulation, heating element, controller, electrical load, packaging, GST and delivery requirements.
What is Lab Furnace typically used for?
Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
What is 1100 Degree Celsius (°C) Lab Furnace 800 x 800 x 885 MM Chamber best suited for?
It is best suited for controlled heating jobs where this exact 800 x 800 x 885 MM chamber size must fit the sample, crucible, tray or batch volume.
Application Examples
- General laboratory heat treatment, drying and ashing across sample types.
- Calcination and loss-on-ignition testing.
- Small-batch annealing and stress-relieving of metal parts.
- Teaching and demonstration use in institutional labs.
Industry Use-Cases
- Multi-purpose QC and testing laboratories.
- Educational institutions running heat-treatment demonstrations.
- Small manufacturers needing an all-round furnace.
- Research groups with varied, low-volume heating needs.
Recommended Accessories
Ceramic sample trays
Spare K-type thermocouple
Heat-resistant handling gloves
PID controller upgrade
Why Choose This Lab Furnace
As a general-purpose muffle furnace, this model covers a broader range of routine heating tasks than a process-specific ashing, tube or sintering furnace, making it the practical default when the lab runs mixed sample types rather than one dedicated process.
