About This 1200°C Digital Lab Furnace 100 x 100 x 225 MM Chamber
Trutherm Digital Lab Furnace models are suitable for laboratory testing, ashing, sintering and heat treatment with multiple temperature ranges and chamber dimensions.
This configuration is suitable when the sample load must fit a 100 x 100 x 225 MM chamber with usable chamber volume of 2.4 litre, approximate power load of 4.1 kW, square chamber profile. It is commonly selected for laboratory, QC, metallurgical, ceramic, pharmaceutical and industrial heat-treatment work requiring stable heating and repeatable process conditions. Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
Equivalent chamber references: 100 x 100 x 225 MM, 10 x 10 x 23 CM and 4 x 4 x 9 INCH. Buyers searching for 1200 Degree Celsius Digital Lab Furnace 100 x 100 x 225 MM chamber; 1200°C Digital Lab Furnace 100 x 100 x 225 MM; 1200 Degree Celsius Digital Lab Furnace 10 x 10 x 23 CM chamber; 1200°C Digital Lab Furnace 10 x 10 x 23 CM; 1200 Degree Celsius Digital Lab Furnace 4 x 4 x 9 INCH chamber; 1200°C Digital Lab Furnace 4 x 4 x 9 INCH can verify the same physical chamber on this canonical product page before requesting price, GST invoice, packaging and delivery.
Trutherm manufactures 1200 Degree Celsius (°C) Digital Lab Furnace 100 x 100 x 225 MM Chamber for buyers who search by exact machine type, chamber size and 1200°C temperature rating. This page is specific to the MM dimension version, so the chamber size is presented in the unit normally used in the buyer's drawing, tender or purchase request.
Routine QC and teaching labs value a muffle furnace precisely because one unit can cover several standard test methods without dedicated process-specific tooling.
Uniform chamber heating and a simple door-loading design make a muffle furnace straightforward to standardise across multiple operators and shifts.
FAQs for 1200 Degree Celsius (°C) Digital Lab Furnace 100 x 100 x 225 MM Chamber
What is 1200 Degree Celsius (°C) Digital Lab Furnace 100 x 100 x 225 MM Chamber best suited for?
It is best suited for controlled heating jobs where this exact 100 x 100 x 225 MM chamber size must fit the sample, crucible, tray or batch volume.
Can Trutherm supply 1200 Degree Celsius (°C) Digital Lab Furnace 100 x 100 x 225 MM Chamber with custom controls?
Yes. Controller type, safety devices, body material, power connection and documentation can be configured according to application and site requirements.
Is this chamber size available in CM and INCH also?
Yes. The same chamber is listed as 100 x 100 x 225 MM, 10 x 10 x 23 CM and 4 x 4 x 9 INCH so searches and purchase documents using any common dimension unit match this product.
How is pricing decided for 1200 Degree Celsius (°C) Digital Lab Furnace 100 x 100 x 225 MM Chamber?
Price depends on chamber size, temperature rating, insulation, heating element, controller, electrical load, packaging, GST and delivery requirements.
What is Digital Lab Furnace typically used for?
Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
Application Examples
- General laboratory heat treatment, drying and ashing across sample types.
- Calcination and loss-on-ignition testing.
- Small-batch annealing and stress-relieving of metal parts.
- Teaching and demonstration use in institutional labs.
Industry Use-Cases
- Multi-purpose QC and testing laboratories.
- Educational institutions running heat-treatment demonstrations.
- Small manufacturers needing an all-round furnace.
- Research groups with varied, low-volume heating needs.
Recommended Accessories
Ceramic sample trays
Spare K-type thermocouple
Heat-resistant handling gloves
PID controller upgrade
Why Choose This Digital Lab Furnace
As a general-purpose muffle furnace, this model covers a broader range of routine heating tasks than a process-specific ashing, tube or sintering furnace, making it the practical default when the lab runs mixed sample types rather than one dedicated process.
