About This 1200°C O x idation Furnace 100 x 100 x 225 MM Chamber
This furnace is used to intentionally oxidize materials, either as a processing step (e.g., growing oxide films on silicon wafers) or to test a material's oxidation resistance. Operating at temperatures like 800°C, it exposes samples to an oxygen-rich environment. The working principle involves flowing oxygen or air through a heated chamber containing the sample. Its purpose in semiconductor manufacturing is to create silicon dioxide insulating layers. In materials testing, it is used to measure weight gain over time to evaluate alloys for high-temperature service, such as in turbine engines.
Equivalent chamber references: 100 x 100 x 225 MM, 10 x 10 x 23 CM and 4 x 4 x 9 INCH. Buyers searching for 1200 Degree Celsius Oxidation Furnace 100 x 100 x 225 MM chamber; 1200°C Oxidation Furnace 100 x 100 x 225 MM; 1200 Degree Celsius Oxidation Furnace 10 x 10 x 23 CM chamber; 1200°C Oxidation Furnace 10 x 10 x 23 CM; 1200 Degree Celsius Oxidation Furnace 4 x 4 x 9 INCH chamber; 1200°C Oxidation Furnace 4 x 4 x 9 INCH can verify the same physical chamber on this canonical product page before requesting price, GST invoice, packaging and delivery.
Trutherm manufactures 1200 Degree Celsius (1200°C) Oxidation Furnace 100 x 100 x 225 MM Chamber for buyers who search by exact machine type, chamber size and 1200°C temperature rating. This page is specific to the MM dimension version, so the chamber size is presented in the unit normally used in the buyer's drawing, tender or purchase request.
This configuration is suitable when the sample load must fit a 100 x 100 x 225 MM chamber with usable chamber volume of 2.4 litre, approximate power load of 4.1 kW, square chamber profile. It is commonly selected for laboratory, QC, metallurgical, ceramic, pharmaceutical and industrial heat-treatment work requiring stable heating and repeatable process conditions. Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
A muffle furnace isolates the sample from direct contact with heating elements or combustion gases, giving cleaner, more repeatable results than an open flame or hot-plate process.
Because muffle furnaces are used across ashing, drying, calcination and light heat-treatment, the chamber and controller are specified for flexibility rather than one narrow process window.
FAQs for 1200 Degree Celsius (1200°C) O x idation Furnace 100 x 100 x 225 MM Chamber
What is Oxidation Furnace typically used for?
Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
What is 1200 Degree Celsius (1200°C) Oxidation Furnace 100 x 100 x 225 MM Chamber best suited for?
It is best suited for controlled heating jobs where this exact 100 x 100 x 225 MM chamber size must fit the sample, crucible, tray or batch volume.
Can Trutherm supply 1200 Degree Celsius (1200°C) Oxidation Furnace 100 x 100 x 225 MM Chamber with custom controls?
Yes. Controller type, safety devices, body material, power connection and documentation can be configured according to application and site requirements.
Is this chamber size available in CM and INCH also?
Yes. The same chamber is listed as 100 x 100 x 225 MM, 10 x 10 x 23 CM and 4 x 4 x 9 INCH so searches and purchase documents using any common dimension unit match this product.
How is pricing decided for 1200 Degree Celsius (1200°C) Oxidation Furnace 100 x 100 x 225 MM Chamber?
Price depends on chamber size, temperature rating, insulation, heating element, controller, electrical load, packaging, GST and delivery requirements.
Application Examples
- General laboratory heat treatment, drying and ashing across sample types.
- Calcination and loss-on-ignition testing.
- Small-batch annealing and stress-relieving of metal parts.
- Teaching and demonstration use in institutional labs.
Industry Use-Cases
- Multi-purpose QC and testing laboratories.
- Educational institutions running heat-treatment demonstrations.
- Small manufacturers needing an all-round furnace.
- Research groups with varied, low-volume heating needs.
Recommended Accessories
Ceramic sample trays
Spare K-type thermocouple
Heat-resistant handling gloves
PID controller upgrade
Why Choose This Oxidation Furnace
As a general-purpose muffle furnace, this model covers a broader range of routine heating tasks than a process-specific ashing, tube or sintering furnace, making it the practical default when the lab runs mixed sample types rather than one dedicated process.
