| Category | Muffle Furnace |
| Model | Oxidation Furnace |
| Max Temperature | 1400°C (2552°F) |
| Working Temperature | 1300°C |
| Thermocouple Type | B (Platinum-30% Rhodium) |
| Thermocouple Details | Tolerance Class 2, 200 to +1700°C range, High purity alumina insulation, Platinum-Rhodium alloy sheath, 8mm diameter, Type B |
| Heating Element | Silicon Carbide (SiC) |
| Element Details | Max temp: 1600°C, High power density, Brittle material, SiC heating elements |
| Chamber (MM) | 625 x 315 x 315 |
| Outer Body (MM) | 1035.0 x 930.0 x 600.0 |
| Chamber Volume | 62 Litres |
| Volume (cu.ft) | 21.1 ft³ |
| Power Load | 15.09 kW |
| Power Supply | 440V, Three Phase |
| Gross Weight | 173.3 kg |
| Chamber Shape | Rectangular - wide |
This furnace is used to intentionally oxidize materials, either as a processing step (e.g., growing oxide films on silicon wafers) or to test a material's oxidation resistance. Operating at temperatures like 800°C, it exposes samples to an oxygen-rich environment. The working principle involves flowing oxygen or air through a heated chamber containing the sample. Its purpose in semiconductor manufacturing is to create silicon dioxide insulating layers. In materials testing, it is used to measure weight gain over time to evaluate alloys for high-temperature service, such as in turbine engines.
This configuration is suitable when the sample load must fit a 625 x 315 x 315 MM chamber with usable chamber volume of 62 litre, approximate power load of 15.3 kW, rectangular - wide chamber profile. It is commonly selected for laboratory, QC, metallurgical, ceramic, pharmaceutical and industrial heat-treatment work requiring stable heating and repeatable process conditions. Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
Equivalent chamber references: 625 x 315 x 315 MM, 63 x 32 x 32 CM and 25 x 12 x 12 INCH. Buyers searching for 1400 Degree Celsius Oxidation Furnace 625 x 315 x 315 MM chamber; 1400°C Oxidation Furnace 625 x 315 x 315 MM; 1400 Degree Celsius Oxidation Furnace 63 x 32 x 32 CM chamber; 1400°C Oxidation Furnace 63 x 32 x 32 CM; 1400 Degree Celsius Oxidation Furnace 25 x 12 x 12 INCH chamber; 1400°C Oxidation Furnace 25 x 12 x 12 INCH can verify the same physical chamber on this canonical product page before requesting price, GST invoice, packaging and delivery.
Trutherm manufactures 1400 Degree Celsius (°C) Oxidation Furnace 625 x 315 x 315 MM Chamber for buyers who search by exact machine type, chamber size and 1400°C temperature rating. This page is specific to the MM dimension version, so the chamber size is presented in the unit normally used in the buyer's drawing, tender or purchase request.
A muffle furnace isolates the sample from direct contact with heating elements or combustion gases, giving cleaner, more repeatable results than an open flame or hot-plate process.
Because muffle furnaces are used across ashing, drying, calcination and light heat-treatment, the chamber and controller are specified for flexibility rather than one narrow process window.
As a general-purpose muffle furnace, this model covers a broader range of routine heating tasks than a process-specific ashing, tube or sintering furnace, making it the practical default when the lab runs mixed sample types rather than one dedicated process.