About This 1200°C Laboratory Furnace 875 x 875 x 885 MM Chamber
Trutherm Laboratory Furnace models are supplied with suitable controller, heating element, refractory insulation and chamber size options for accurate lab heating work.
Trutherm manufactures 1200 Degree Celsius (°C) Laboratory Furnace 875 x 875 x 885 MM Chamber for buyers who search by exact machine type, chamber size and 1200°C temperature rating. This page is specific to the MM dimension version, so the chamber size is presented in the unit normally used in the buyer's drawing, tender or purchase request.
This configuration is suitable when the sample load must fit a 875 x 875 x 885 MM chamber with usable chamber volume of 677.6 litre, approximate power load of 40.4 kW, square chamber profile. It is commonly selected for laboratory, QC, metallurgical, ceramic, pharmaceutical and industrial heat-treatment work requiring stable heating and repeatable process conditions. Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
Equivalent chamber references: 875 x 875 x 885 MM, 88 x 88 x 89 CM and 35 x 35 x 35 INCH. Buyers searching for 1200 Degree Celsius Laboratory Furnace 875 x 875 x 885 MM chamber; 1200°C Laboratory Furnace 875 x 875 x 885 MM; 1200 Degree Celsius Laboratory Furnace 88 x 88 x 89 CM chamber; 1200°C Laboratory Furnace 88 x 88 x 89 CM; 1200 Degree Celsius Laboratory Furnace 35 x 35 x 35 INCH chamber; 1200°C Laboratory Furnace 35 x 35 x 35 INCH can verify the same physical chamber on this canonical product page before requesting price, GST invoice, packaging and delivery.
Uniform chamber heating and a simple door-loading design make a muffle furnace straightforward to standardise across multiple operators and shifts.
Where sample volume and process type vary week to week, a general-purpose muffle furnace avoids the cost of maintaining several process-specific furnace types.
FAQs for 1200 Degree Celsius (°C) Laboratory Furnace 875 x 875 x 885 MM Chamber
What is 1200 Degree Celsius (°C) Laboratory Furnace 875 x 875 x 885 MM Chamber best suited for?
It is best suited for controlled heating jobs where this exact 875 x 875 x 885 MM chamber size must fit the sample, crucible, tray or batch volume.
Can Trutherm supply 1200 Degree Celsius (°C) Laboratory Furnace 875 x 875 x 885 MM Chamber with custom controls?
Yes. Controller type, safety devices, body material, power connection and documentation can be configured according to application and site requirements.
Is this chamber size available in CM and INCH also?
Yes. The same chamber is listed as 875 x 875 x 885 MM, 88 x 88 x 89 CM and 35 x 35 x 35 INCH so searches and purchase documents using any common dimension unit match this product.
How is pricing decided for 1200 Degree Celsius (°C) Laboratory Furnace 875 x 875 x 885 MM Chamber?
Price depends on chamber size, temperature rating, insulation, heating element, controller, electrical load, packaging, GST and delivery requirements.
What is Laboratory Furnace typically used for?
Typical use includes general laboratory and industrial heat-treatment applications requiring stable, repeatable temperature control.
Application Examples
- General laboratory heat treatment, drying and ashing across sample types.
- Calcination and loss-on-ignition testing.
- Small-batch annealing and stress-relieving of metal parts.
- Teaching and demonstration use in institutional labs.
Industry Use-Cases
- Multi-purpose QC and testing laboratories.
- Educational institutions running heat-treatment demonstrations.
- Small manufacturers needing an all-round furnace.
- Research groups with varied, low-volume heating needs.
Recommended Accessories
Ceramic sample trays
Spare K-type thermocouple
Heat-resistant handling gloves
PID controller upgrade
Why Choose This Laboratory Furnace
As a general-purpose muffle furnace, this model covers a broader range of routine heating tasks than a process-specific ashing, tube or sintering furnace, making it the practical default when the lab runs mixed sample types rather than one dedicated process.
